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by H. V. Jansen,M. Elwenspoek
Download Silicon Micromachining (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering) fb2
Engineering
  • Author:
    H. V. Jansen,M. Elwenspoek
  • ISBN:
    052159054X
  • ISBN13:
    978-0521590549
  • Genre:
  • Publisher:
    Cambridge University Press (May 13, 1999)
  • Pages:
    420 pages
  • Subcategory:
    Engineering
  • Language:
  • FB2 format
    1366 kb
  • ePUB format
    1659 kb
  • DJVU format
    1119 kb
  • Rating:
    4.1
  • Votes:
    871
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FREE shipping on qualifying offers. This comprehensive book provides an overview of the key techniques used in the fabrication of micron-scale structures in silicon. Recent advances in these techniques have made it possible to create a new generation of microsystem devices has been added to your Cart.

Cambridge Studies in Semiconductor Physics and Microelectronic Engineering will contain books on all aspects of semiconductors, from materials at one end of the scale through to VLSI circuits at the other. Books in the series will therefore cover the fundamental physics underlying the properties of semiconductor materials and structures, materials growth, properties and characterisation techniques, and the fabrication and applications of devices and circuits.

M. Elwenspoek, H. V. Jansen. Silicon Micromachining (Cambridge Studies in Semiconductor Physics and. 1 2 3 4 5. Want to Read. Are you sure you want to remove Silicon Micromachining (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering) from your list? Silicon Micromachining (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering). by M. Elwenspoek, M.

Silicon Micromachining. Elwenspoek and . Recent advances in these techniques have made it possible to create a new generation of microsystem devices, such as microsensors, accelerometers, micropumps, and miniature robots.

Electrons and Phonons in Semiconductor Multilayers (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering). Electrons and Phonons in Semiconductor Multilayers (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering).

Microelectronic Engineering. Nanotechnology and Processing - Electronics, photonics, MEMS and Life Sciences.

Items related to Silicon Micromachining (Cambridge Studies in Semiconductor. This comprehensive book provides an overview of the key techniques used in the fabrication of micron-scale structures in silicon

Items related to Silicon Micromachining (Cambridge Studies in Semiconductor. Elwenspoek, . Jansen, H. Silicon Micromachining (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering). ISBN 13: 9780521590549.

The emphasis on high aspect ratio micromachining techniques for microsystems/MEMS has been . Elwenspoek M, Jansen H (1998) Silicon Microengineering Cambridge Studies in Semiconductor Physics and Microelectronics Engineering No. 7Google Scholar

The emphasis on high aspect ratio micromachining techniques for microsystems/MEMS has been mainly to achieve novel devices with, for example, high sensing or actuation performance. 7Google Scholar. Goodall R, Fandel, Allan A, Landler P, Huff H (2002) Long-term productivity mechanisms of the semiconductor industry. In: Semiconductor silicon 2002 proceedings, 9th edn. Electrochemical SocietyGoogle Scholar. Gower MC (2001) Laser micromachining for MEMS devices.

Silicon Micromachining book. This comprehensive book provides an overview of the key techniques. 052159054X (ISBN13: 9780521590549).

Поиск книг BookFi BookSee - Download books for free. 3 Mb. Chemical Vapor Deposition for Microelectronics: Principles, Technology and Applications (Materials Science and Process Technology).

This comprehensive book provides an overview of the key techniques used in the fabrication of micron-scale structures in silicon. Recent advances in these techniques have made it possible to create a new generation of microsystem devices, such as microsensors, accelerometers, micropumps, and miniature robots. The authors underpin the discussion of each technique with a brief review of the fundamental physical and chemical principles involved. They pay particular attention to methods such as isotropic and anisotropic wet chemical etching, wafer bonding, reactive ion etching, and surface micromachining. There is a special section on bulk micromachining, and the authors also discuss release mechanisms for movable microstructures. The book is a blend of detailed experimental and theoretical material, and will be of great interest to graduate students and researchers in electrical engineering and materials science whose work involves the study of micro-electromechanical systems (MEMS).