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by D.K. Bowen,Brian K. Tanner
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Engineering
  • Author:
    D.K. Bowen,Brian K. Tanner
  • ISBN:
    0850667585
  • ISBN13:
    978-0850667585
  • Genre:
  • Publisher:
    CRC Press; 1 edition (February 5, 1998)
  • Pages:
    264 pages
  • Subcategory:
    Engineering
  • Language:
  • FB2 format
    1176 kb
  • ePUB format
    1733 kb
  • DJVU format
    1949 kb
  • Rating:
    4.1
  • Votes:
    413
  • Formats:
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Read instantly in your browser. This is a new generation book.

Read instantly in your browser. Bowen (Author), Brian K. Tanner (Author). ISBN-13: 978-0850667585. Why is ISBN important? ISBN. This book does begin where other related books have finished.

Bowen, Brian K. Tanner. The main aim of the book is to map the theoretical and practical background necessary to the study of single crystal materials by means of high-resolution x-ray diffraction and topography. CRC Press Published October 10, 2019 Reference - 264 Pages ISBN 9780367400637 - CAT K449593. CRC Press Published February 5, 1998 Reference - 264 Pages ISBN 9780850667585 - CAT TF2378. For Instructors Request Inspection Copy. It combines mathematical formalisms with graphical explanations and hands-on practical advice for interpreting data.

High-resolution X-ray diffractometry is used to measure such parameters of heteroepitaxic III–V .

High-resolution X-ray diffractometry is used to measure such parameters of heteroepitaxic III–V layers as the substrate miscut angle α, the relative lattice parameter perpendicular (Δa⊥/as) and parallel (Δa/as) to the interface, and the epitaxic layer tilt angle β. X-ray multiple simultaneous diffraction is expected to provide more structural information and possibly to simplify th.

High Resolution X-Ray Diffractometry and Topography. by D. Keith Bowen and Brian K Tanner. The study and application of electronic materials has created an increasing demand for sophisticated and reliable techniques for examining and characterizing these materials.

Bowen, . Tanner, B. (1998). High Resolution X-Ray Diffractometry And Topography. It provides the the. Table of contents.

Start by marking High Resolution X-Ray Diffractometry and Topography as Want to Read .

Start by marking High Resolution X-Ray Diffractometry and Topography as Want to Read: Want to Read savin. ant to Read.

K. Bowen and B. K. Tanner, High-Resolution X-Ray Diffractometry and Topography (Taylor and Francis, London, 1998). J. Baruchel and J. Hartwig, Basic Courses of 6th Biennial Conference on High Resolution X-Ray Diffraction and Imaging (X-TOP 2002), Grenoble, Aussois (France), 2002, p. 5. 12. M. Koishy, N. Ohya, H. Koizumi, et a. Cryst.

BRIAN . ANNER University of Durham. The purpose of this book is to provide the theoretical and practical background necessary to the study of single-crystal materials by means of high resolution Xray diffractometry and topography. We discuss in depth the techniques of X-ray diffractometry and topography, including both the practical details and the application of the theory in the interpretation of the data. The limits of the techniques are explored throughout, an attitude that takes particular technological importance in the light of the present concern with very thin films and surf ace layers.

Keith Bowen, Brian K.

The study and application of electronic materials has created an increasing demand for sophisticated and reliable techniques for examining and characterizing these materials. This comprehensive book looks at the area of x-ray diffraction and the modern techniques available for deployment in research, development, and production. It provides the theoretical and practical background for applying these techniques in scientific and industrial materials characterization. The main aim of the book is to map the theoretical and practical background necessary to the study of single crystal materials by means of high-resolution x-ray diffraction and topography. It combines mathematical formalisms with graphical explanations and hands-on practical advice for interpreting data.